Low Dielectric Constant Materials for IC Applications

Low Dielectric Constant Materials for IC Applications

P. S. Ho, J. Leu, W. W. Lee (auth.), Professor Paul S. Ho, Jihperng Jim Leu, Wei William Lee (eds.)
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Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for < 0.18 um process technology. Topics include: Organic dielectric materials, Inorganic dielectric materials, Composite dielectric materials, Metrology and characterization techniques, Integration, Reliability. This volume will be an invaluable resource for professionals, scientists, researchers and graduate students involved in dielectric technology development, materials science, polymer science, and semiconductor devices and processing.

Kateqoriyalar:
İl:
2003
Nəşr:
1
Nəşriyyat:
Springer-Verlag Berlin Heidelberg
Dil:
english
Səhifələr:
310
ISBN 10:
3642632211
ISBN 13:
9783642632211
Seriyalar:
Springer Series in Advanced Microelectronics 9
Fayl:
PDF, 5.22 MB
IPFS:
CID , CID Blake2b
english, 2003
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